Apparatuses for mixing of staged methanol injection

ABSTRACT

This present disclosure relates to apparatuses for methylation of aromatics in an aromatics complex for producing a xylene isomer product. More specifically, the present disclosure relates to apparatuses for producing para-xylene by the selective methylation of toluene and/or benzene in an aromatics complex using processed toluene instead of crude toluene.

RELATED APPLICATIONS

This application is a continuation of U.S. Ser. No. 15/849,529 filed onDec. 20, 2017, now a U.S. Pat. No. 10,556,214, the entirety of which isincorporated herein by reference.

FIELD

This present disclosure relates to apparatuses for methylation ofaromatics in an aromatics complex for producing a xylene isomer product.More specifically, the present disclosure relates to the use of riserslip reduction technology to improve the methanol feed and catalystcontacting which will improve the product yield rate.

BACKGROUND

Xylene isomers are produced in large volumes from petroleum asfeedstocks for a variety of important industrial chemicals. The mostimportant of the xylene isomers is para-xylene, the principal feedstockfor polyester, which continues to enjoy a high growth rate from largebase demand. Ortho-xylene is used to produce phthalic anhydride, whichsupplies high-volume but relatively mature markets. Meta-xylene is usedin lesser but growing volumes for such products as plasticizers, azodyes and wood preservers. Ethylbenzene generally is present in xylenemixtures and is occasionally recovered for styrene production, but isusually considered a less-desirable component of C8 aromatics.

Among the aromatic hydrocarbons, the overall importance of xylenesrivals that of benzene as a feedstock for industrial chemicals. Xylenesand benzene are produced from petroleum by reforming naphtha but not insufficient volume to meet demand, thus conversion of other hydrocarbonsis necessary to increase the yield of xylenes and benzene. Often tolueneis de-alkylated to produce benzene or selectively disproportionated toyield benzene and C8 aromatics from which the individual xylene isomersare recovered.

Methylation of toluene or benzene with oxygenates such as methanol hasbeen proposed as a pathway to make xylene and to increase methyl tophenyl ratio in the aromatic complex to maximize xylene production. Forthe toluene methylation process there is a yield advantage to addmethanol at various locations above the main feed injection point. Thereactor is a transport riser style with the feed and catalyst flowingco-currently up the riser. In this riser style and operating conditions,there will be a catalyst velocity gradient in the radial direction inwhich some catalyst will slow down and begin to fall down along theriser wall. In addition, the high upward momentum of catalyst away fromthe wall does not allow the methanol injection from the side of riser topenetrate and mix into the main flow of catalyst. This decreases themethanol injection's effectiveness, and thus yield improvements may notbe realized.

Accordingly, it is desirable to provide improved apparatuses formethylation of aromatic compounds such as toluene and benzene in anaromatics complex. Furthermore, other desirable features andcharacteristics of the present subject matter will become apparent fromthe subsequent detailed description of the subject matter and theappended claims, taken in conjunction with the accompanying drawing andthis background of the subject matter.

SUMMARY

The present subject matter relates to apparatuses for toluene and/orbenzene methylation in an aromatics complex for producing xylene isomer.More specifically, the present disclosure relates to apparatuses fortoluene methylation wherein the use of riser slip reduction technologyto improve the methanol feed and catalyst contacting, which will improvethe product yield rate.

In the foregoing, all temperatures are set forth in degrees Celsius andall parts and percentages are by weight, unless otherwise indicated.Other objects, advantages and applications of the present invention willbecome apparent to those skilled in the art from the following detaileddescription and drawing. Additional objects, advantages and novelfeatures of the examples will be set forth in part in the descriptionwhich follows, and in part will become apparent to those skilled in theart upon examination of the following description and the accompanyingdrawing or may be learned by production or operation of the examples.The objects and advantages of the concepts may be realized and attainedby means of the methodologies, instrumentalities and combinationsparticularly pointed out in the appended claims.

BRIEF DESCRIPTION OF THE DRAWING

The FIGURE illustrates a cross-sectional view of an apparatus fortoluene methylation demonstrating the use of riser slip reductiontechnology to improve the methanol feed and catalyst contacting.

DETAILED DESCRIPTION

The following detailed description is merely exemplary in nature and isnot intended to limit the application and uses of the embodimentdescribed. Furthermore, there is no intention to be bound by any theorypresented in the preceding background or the following detaileddescription.

The description of the apparatus of this invention is presented withreference to the attached FIGURE. The FIGURE is a simplified diagram ofthe preferred embodiment of this invention and is not intended as anundue limitation on the generally broad scope of the descriptionprovided herein and the appended claims. Certain hardware such asvalves, pumps, compressors, heat exchangers, instrumentation andcontrols, have been omitted as not essential to a clear understanding ofthe invention. The use and application of this hardware is well withinthe skill of the art.

The various embodiments described herein relate to apparatuses fortoluene and/or benzene methylation in an aromatics complex for producingxylene isomer. As shown in the FIGURE, an apparatus 10 comprises a riser12, which is a toluene methylation stage methanol injection riserreactor. In the riser, there is falling catalyst 14 that falls downwardon the edges of the riser 12 and a majority of the catalyst 16 that isrising within the riser 12 along with vapor 18. The riser 12 includes atleast one riser slip reduction technology, hereinafter referred to as abaffle 20.

In one embodiment, the baffles 20 are positioned symmetrically aroundthe circumference of the riser 12. In another embodiment, the baffles 20are arranged non-symmetrically. In some embodiments, the baffles 20 cancover less of the circumference, if desired. For example, typically atleast about 30% of the circumference is covered with baffles 20, or atleast about 40%, or at least about 50%, or at least about 60%, or atleast about 70%, or at least about 80%, or at least about 90%, or atleast about 95%.

The baffles 20 extend inward from the wall a distance up to about 25% ofthe radius of the riser, typically in the range of about 10% to about30%. The length depends in part on the radius of the riser 12 and theangle from the wall. The angle of the baffles 20 ranges from about 5° toabout 80° from vertical. The baffles 20 may be coupled with additionallining to ensure the erosion resistance.

The riser 12 desirably has at least two rows of baffles 20 along itslength so that the core-annulus structure does not return to itsoriginal state as it flows up the riser 12. However, if there are toomany rows of baffles 20, the catalyst-laden vapors flowing upward willsimply bypass the baffles 20 altogether, effectively reducing thediameter of the riser 12.

A number of factors can be considered in determining the appropriateangle for the baffles 20 in a particular riser 12. One consideration ismixing, with larger angles producing greater mixing. Another factor isthe amount of erosion, which is greater for larger angles. Still anotherfactor is the pressure drop generated by the baffles 20, which isgreater for baffles 20 having larger angles than for those with smallerangles. In addition, the effect of thermal differential growth should beevaluated. When the angle is about 90°, the wall and the baffle mightexpand at different rates, which could potentially lead to cracking.With smaller angles, such as about 10° to about 45°, the relatively longinclined support plate provides a longer path for heat transfer. Thisminimizes the thermal differential growth of the baffle, especiallyunder transient conditions, such as start-up or shut-down.

The baffles 20 are made of a material having sufficient erosion- andtemperature-resistance to withstand the riser conditions. Suitablematerials include metal plates, such as stainless steel plates, coveredwith ceramic on at least the front face facing the upward flow toprevent erosion. The back side away from the flow can be covered withabrasion-resistant refractory. Alternatively, both sides can be coveredwith ceramic.

The riser 12 also includes a plurality of distributors 30 for thedelivery of methanol into the riser 12. In one embodiment, thedistributors 30 may be located above the baffles. In another embodiment,the distributors 30 may be located through the baffle 20, allowing forthe distribution of methanol to enter the inside of the riser 12 at adifferent radial position. In yet another embodiment, the distributors30 may be located beneath the baffles 20. The distributors 30 delivermethanol to the riser 12.

While the invention has been described with what are presentlyconsidered the preferred embodiments, it is to be understood that theinvention is not limited to the disclosed embodiments, but it isintended to cover various modifications and equivalent arrangementsincluded within the scope of the appended claims.

Specific Embodiments

While the following is described in conjunction with specificembodiments, it will be understood that this description is intended toillustrate and not limit the scope of the preceding description and theappended claims.

A first embodiment of the invention is an apparatus, comprising acylindrical riser comprising an outer wall and an inner wall, whereinthe inner wall comprises at least one baffle affixed to the inner wallextending inward into the riser, a bottom opening, and upper opening,and at least one distributor. An embodiment of the invention is one, anyor all of prior embodiments in this paragraph up through the firstembodiment in this paragraph, wherein the baffle extends around theentire inner wall of the riser reactor. An embodiment of the inventionis one, any or all of prior embodiments in this paragraph up through thefirst embodiment in this paragraph, wherein the distributor is locatedabove the baffles. An embodiment of the invention is one, any or all ofprior embodiments in this paragraph up through the first embodiment inthis paragraph, wherein the distributor is located below the baffles. Anembodiment of the invention is one, any or all of prior embodiments inthis paragraph up through the first embodiment in this paragraph,wherein the distributor extends through the baffle and into a differentradial location within the riser reactor. An embodiment of the inventionis one, any or all of prior embodiments in this paragraph up through thefirst embodiment in this paragraph, wherein the distributor is angledfrom 30 degrees to 120 degrees relative to the riser wall. An embodimentof the invention is one, any or all of prior embodiments in thisparagraph up through the first embodiment in this paragraph, wherein thedistributors are located at two different axial locations within theriser reactor. An embodiment of the invention is one, any or all ofprior embodiments in this paragraph up through the first embodiment inthis paragraph, wherein there are at least two rows of baffles. Anembodiment of the invention is one, any or all of prior embodiments inthis paragraph up through the first embodiment in this paragraph,wherein the baffles are arranged symmetrically around the wall of theriser. An embodiment of the invention is one, any or all of priorembodiments in this paragraph up through the first embodiment in thisparagraph, wherein baffles cover substantially the entire circumferenceof the riser. An embodiment of the invention is one, any or all of priorembodiments in this paragraph up through the first embodiment in thisparagraph, wherein the riser reactor is a toluene methylation riserreactor. A apparatus, comprising a cylindrical riser comprising an outerwall and an inner wall, wherein the inner wall comprises at least onebaffle affixed to the inner wall extending inward into the risercovering substantially the entire circumference of the riser, a bottomopening, and upper opening, and two distributors located above thebaffles. An embodiment of the invention is one, any or all of priorembodiments in this paragraph up through the first embodiment in thisparagraph, wherein the distributors extend through the baffle and into adifferent radial location within the riser reactor. An embodiment of theinvention is one, any or all of prior embodiments in this paragraph upthrough the first embodiment in this paragraph, wherein the distributoris angled from 30 degrees to 120 degrees relative to the riser wall. Anembodiment of the invention is one, any or all of prior embodiments inthis paragraph up through the first embodiment in this paragraph,wherein there are at least two rows of baffles. An embodiment of theinvention is one, any or all of prior embodiments in this paragraph upthrough the first embodiment in this paragraph, wherein the baffles arearranged symmetrically around the wall of the riser. An embodiment ofthe invention is one, any or all of prior embodiments in this paragraphup through the first embodiment in this paragraph, wherein the riserreactor is a toluene methylation riser reactor.

A second embodiment of the invention is an apparatus, comprising acylindrical riser comprising an outer wall and an inner wall, whereinthe inner wall comprises at least one baffle affixed to the inner wallextending inward into the riser covering substantially the entirecircumference of the riser, a bottom opening, and upper opening, and twodistributors located below the baffles. An embodiment of the inventionis one, any or all of prior embodiments in this paragraph up through thesecond embodiment in this paragraph, wherein the distributors extendthrough the baffle and into a different radial location within the riserreactor. An embodiment of the invention is one, any or all of priorembodiments in this paragraph up through the second embodiment in thisparagraph, wherein the distributor is angled from 30 degrees to 120degrees relative to the riser wall.

Without further elaboration, it is believed that using the precedingdescription that one skilled in the art can utilize the presentinvention to its fullest extent and easily ascertain the essentialcharacteristics of this invention, without departing from the spirit andscope thereof, to make various changes and modifications of theinvention and to adapt it to various usages and conditions. Thepreceding preferred specific embodiments are, therefore, to be construedas merely illustrative, and not limiting the remainder of the disclosurein any way whatsoever, and that it is intended to cover variousmodifications and equivalent arrangements included within the scope ofthe appended claims. In the foregoing, all temperatures are set forth indegrees Celsius and, all parts and percentages are by weight, unlessotherwise indicated.

The invention claimed is:
 1. A riser reactor, comprising: a cylindricalriser comprising an outer wall and an inner wall; at least one baffleaffixed to the inner wall extending into the riser; and at least onedistributor configured to inject methanol into the riser, wherein the atleast one distributor is located above the at least one baffle, belowthe at least one baffle, extends through the at least one baffle andinto a different radial location within the riser reactor, or acombination thereof.
 2. The riser reactor of claim 1, wherein the atleast one baffle extends around the entire inner wall of the riserreactor.
 3. The riser reactor of claim 1, wherein the at least onedistributor is angled from 30 degrees to 120 degrees relative to theinner wall.
 4. The riser reactor of claim 1, further comprising a seconddistributor, wherein the distributors are located at two different axiallocations within the riser reactor.
 5. The riser reactor of claim 1,wherein there are at least two rows of baffles.
 6. The riser reactor ofclaim 1, further comprising a plurality of baffles and wherein thebaffles are arranged symmetrically around the inner wall of the riser.7. The riser reactor of claim 1, further comprising a plurality ofbaffles and wherein baffles cover substantially a circumference of theriser.
 8. The riser reactor of claim 1, wherein the riser reactor is atoluene methylation riser reactor.